To be updated soon...


About the school

The objective is to enhance the knowledge of the participants in the area of advanced lithography and device fabrication, particularly how lithography technique is used for fabrication of semiconductor devices. In addition, and considering that photoresists are key materials for lithography applications, the participants will be educated with the resists technology and the current trend. The current global market size of semiconductor devices are approaching multi billion dollars. Starting from hi-tech applications including aerospace, defence etc to daily life requirements, semiconductor devices are inevitable. There will be discussion on how the advancement in this area will meet our national strategic needs as well as improve country’s economy with creation of many jobs. The audience will be exposed to the experienced individuals involved in device fabrication. Detailed description on functioning and importance of cleanroom will be another emphasis. Hence, the school will provide a platform for an in-depth discussion on the current technologies, tools, strategies and various challenges as well as their possible remedies which will certainly benefit young minds from academic and R&D institutions.

Who can attend this school?
The school will be open for Faculty members/ Students of engineering/ science colleges, practitioner from industries and other organizations.

How many applicants will be considered?
Maximum of 40 applicants will be selected for this school as the aim is provide a platform not only for listening lectures but to ensure intense interaction with the experts. Initially, all participants will be provided hands on training on basic lithography technology and device fabrication for four days. On fifth day, an exam will be conducted. The candidates will be given exposure to many state-of art instrumental techniques often used in the area of lithography, characterization and device fabrication. The participants will be divided into small groups and demonstrations/hands-on training will be given to each individual group so that each participant gets sufficient exposure to these techniques.

Few of them are:-

1-2 hours demonstration on imaging using Field-Emission Scanning Electron Microscope (FESEM). Similarly, 1-2 hours demonstration on high –resolution TEM.
Demonstration on X-ray photo-electron spectroscopy (XPS).
Demonstration on thin film formation using spin-coater and characterization.
Demonstration on optical lithography (both 365nm &248 nm)
Demonstration on electron beam lithography (EBL).
Demonstration of 100 clean room facility.
There will be many such demonstrations. Again, the objective of this school is to provide ample opportunity to each participant to have interaction with the speakers/instructors closely and, to give them full exposure to modern instrumental techniques. All participants will be provided with the certificates.


Topics of discussion and demonstration:

  • Theme 1: Photoresists technology: Design, processing and technology
  • a) Evolution of resist technology: A philosophical note
  • b) i-Line resists (365 nm): Processing, formulation and application
  • c) DUV resists (248 nm): Workhorses for last many years

  • Theme 2: Lithography processes and tools
  • a) Basics of lithography
  • b) E-beam technology and functioning
  • c) Pattern etching: A key technology

  • Theme 3: Devices
  • a) Fabrication of ICs: A practical perspective
  • b) VLSI Design principle

How to apply

Application can be submitted by sending email with CV to


Mandi is a small town at the center of Himachal Pradesh, on the way to the popular resorts of Kullu and Manali. The main campus of IIT Mandi is situated in Kamand vilage, which is 14 kilometers away from Mandi town.



  IIT Mandi, Kamand Campus,
  VPO Kamand, Distt. Mandi, Himachal Pradesh,
  PIN - 175005, India.


In case of any query, applicants may send email to ID
In addition to above the applicants may also write ro Following IDs:
Contact: (+91) 9459527580
Contact: (+91) 9816979751
Contact: (+91) 1905 267069
Contact: (+91) 9816154319

Air Travel

The nearest airport to Mandi is the Kullu Airport at Bhuntar, Dharamshala airport at Gaggal and Chandigarh airport. Flights to Kullu are restricted to only from Delhi, and Shimla.

By Road

From Delhi or Chandigarh, one can catch the bus from ISBT (interstate bus terminus). There are different varieties of bus facilities from Delhi and Chandigarh - ordinary, deluxe and AC buses. Alternatively, One can also plan to hire a cab or come by personal vehicle.
HRTC Booking: Check Now
Red Bus Booking: Check Now

Travel Notes

This distance to Mandi can be covered in approximately 12 hrs from Delhi and 6 hrs from Chandigarh (it depends on traffic on the roads or weather conditions) by bus. Transport to IIT Mandi Kamand campus from Mandi town will be arranged by IIT Mandi.

  • Registration fees: Rs. 2000/- for students
  • Rs. 3000/- for faculty
  • Rs. 5000/- industry personnel

Important dates

  • Last date of submission of application- May 31, 2019
  • Selected candidates will be intimated by June 7, 2019
  • Fees submission: Last date – June 15, 2019
  • Bank Details

  • BANK ACCOUNT NUMBER- 7315000100034369
  • MICR CODE OF BANK - 175024138 ,
  • Accommodation

    Accommodation in student hostel will be provided free of cost. However, if any one requires guesthouse facility, same can be provided on payment basis. To mention, IIT Mandi has very good guesthouse facility.


    Food will be provided free of cost.


  • Axenic Systems
  • Research AID Instruments & Services
  • Ambika Traders
  • Obexo Scientific
  • M/S. Ram Traders
  • Galaxy Lab Solution
  • Klorofil Scientific
  • Instructors

    All the instructors of this School are chosen such that they have extensive hands-on experience in lithography, device fabrication and design. They are either from industries or from academic institutes. The final list of instructors will appear on our website shortly

    Confirmed instructors

  • Dr. Ananth Venkatesan, IISER Mohali
  • Dr Venkatesan is a low temperature physicist. He works on 2-D electron systems and nanomechanical resonators. His group extensively uses e-beam lithography for fabrication of devices.

  • Dr. Mahadeva Bhat K., GAETEC, Hyderabad
  • M.Sc. in Materials Science from Mangalore University, India, in 1993. Research student at IISc Bangalore 1993 to 1996 Joined Solid State Physics Laboratory, India as Scientist 1996 to 2000 Scientist at SSPL MMIC Research Centre ( SMRC) GAETEC Hyderabad from 2000 till date Doctorate in physics from IIT Madras, Chennai, India in the year 2013.  Post doctoral fellowship at Arizona state University and University of California Davis 1996 and 1997 Research Interests: GaAs based Transistors and MMICs technology and manufacturing, GaN based vertical Diodes and Transistors, Epitaxial growth of III-V compound based heterostructures for high electron mobility transistor applications

  • Er. Arpit Saraswat, SCL, Mohali
  • Arpit Saraswat is currently working as Sci./Engr. 'SD' in Semi-Conductor Laboratory, Mohali after completing his B.Tech in Avionics from Indian Institute of Space Science and Technology (IIST), Trivandrum in the year 2011. He joined the VLSI Fabrication Division in Photolithography section and has been contributing his services ever since. He has been instrumental to the establishment of 8" Lithography CMOS and CCD process in SCL and has been managing the production in the 8" wafer fab line. He has also been handling the troubleshooting and maintenance of the Photolithography process and metrology tools and has been actively involved in DOE of new device/process variants.

  • Dr. Vignesh Viswanathan,ZEISS Research Microscopy Solutions, Singapore
  • Prof. Kenneth E Gonsalves, IIT Mandi
  • Since Jan 2012 Dr Gonsalves is Distinguished Professor at IIT Mandi. Prior to that Prof. Gonsalves was the Celanese Acetate Distinguished Professor at the University of North Carolina at Charlotte (UNCC) from 2001 to 2014. He was also a faculty member at the Center for Optoelectronics and Optical Communications at UNCC. His research has focused on materials synthesis: organic polymer chemistry, organometallic polymers, polymer and molecular precursors for ceramics and intermetallic; nanostructured materials/composites; biomaterials; novel resists for nanolithography; nanofabrication and nanopatterning of biomaterials; nanoscale drug delivery devices. His recent projects on nanolithography have been supported by the US NSF, DARPA, SEMATECH INT, INTEL Corp. & Rohm and Haas/Dow Electronic Materials. He is now a consultant to active projects on resist technologies funded by SCL (ISRO) Mohali, MHRD (UAY) and DST at IIT Mandi.

  • Dr. Satinder Kumar Sharma, IIT Mandi
  • Satinder K. Sharma received the Master of Science in Physics (Electronic Science) from Himachal Pradesh University, Shimla, India, in 2002 and the Ph.D. degree from Department of Electronic Science, Kurukshetra University, Kurukshetra, India, in 2007. From 2007 to 2010, he was a Postdoctoral Fellow at the DST Unit on Nanosciences at Department of Chemical Engineering (CHE), Indian Institute of Technology (IIT) Kanpur, Kanpur, India. From 2010 to 2012 he worked as Assistant Professor, faculty in the Electronics and Microelectronics Division, Indian Institute of Information Technology (IIIT), Allahabad, India. From 2012 to 2015 he worked as an Assistant Professor in the School of Computing and Electrical Engineering (SCEE), at Indian Institute of Technology (IIT), Mandi, (Himachal Pradesh), India. From 2016 onwards he has been working as an Associate Professor in the School of Computing and Electrical Engineering (SCEE), at Indian Institute of Technology (IIT), Mandi, (Himachal Pradesh), India. In addition to this 2015 he also worked as Visiting Faculty for short duration, Institute of Semiconductor Electronics (IHT), Stuttgart University, Stuttgart, Germany. Dr. Sharma published more than 70 publications in the international peer review Journals. Furthermore, also presented several invited talks and research papers more than 45 international and national conferences along with he also submitted six patents from their research findings. His current research interests include micro/nanoelectronics CMOS device fabrication and characterization, MEMS and NEMS, nanocomposite, sensors, photovoltaic, and self-assembly.

  • Dr. Hitesh Shrimali, IIT Mandi
  • HITESH SHRIMALI (S’09-M’13-SM’18) was born in Ahmedabad, India. He received the bachelor of engineering (B.E.) degree from the Nirma Institute of Technology, Ahmedabad, India, and the master of technology (M.Tech.) degree from IIT Kharagpur, Kharagpur, India, both in instrumentation engineering, and Ph.D. degree in analog and mixed-signal VLSI design from IIT Delhi, Delhi, India. He was with STMicroelectronics, Noida, India, for two years (August 2011 - June 2013) in the technology R&D department of analog-to-digital converter team of analog and mixed-signal group. From June 2013 to December 2014, he was a Post-doctorate Researcher with the University of Milan. Since Dec. 2014 to Jun. 2019, he has been working with IIT Mandi as an assistant professor. Currently, he is serving IIT Mandi as an associate professor. Dr. Shrimali has authored and co-authored many papers in peer-reviewed international journals and conferences. His areas of expertise include design and testing of radiation hard circuits (CMOS silicon detectors), analog and mixed-signal VLSI design (ADCs), modeling of radiation effects on analog and mixed signal circuits, and on-chip instrumentation. Dr. Shrimali has served as a Reviewer for the IEEE TVLSI, Journal of Circuits, Systems and Signal Processing (Springer), IETE, IEEE ISCAS, IEEE VLSID, MWSCAS, etc. He has served as an Organizing Committee Member and a fellowship chair for IEEE EDAPS 2018 and IEEE VDAT 2019, respectively. Moreover, he has served as a TPC Member for IEEE EDAPS, IEEE MWSCAS 2018, ISCAS 2019 and VLSID 2018. Dr. Shrimali is a recipient of Young Faculty Research Fellowship (YFRF), MeitY, Govt. of India from Jan’19 to Dec’2024. He also received distinguished alumni award 2017 for instrumentation engineering department of Nirma University, Ahmedabad, India.

  • Dr. Prashant Verma, SAC, Ahmedabad
  • Prashant Varma received B. Tech. degree in Electronics and Communication from Institute of Technology & Management, Gorakhpur in 2005. He is currently Scientist/Engineer-SF and Dy. Head, Micro Lithography Division at Space Applications Centre, ISRO, Ahmedabad. He leads a team working on electron beam and optical lithography techniques for the fabrication of space worthy Surface Acoustic Wave devices, Microwave Integrated Circuits and microwave devices. He has initiated and is also responsible for the establishment of required infrastructure and development of fabrication technologies for micro & diffractive optical elements such as blazed gratings, wire grid polarisers and micro lens arrays etc. Besides receiving recognitions for development of innovative processes, and transfer of technology to Indian industry etc., he is also a recipient of ISRO Young Scientist Award-2017.

  • Dr. Vanita Agarwal, SSPL, Scientist G
  • Vanita Rani Agarwal, is Senior scientist at Solid state Physics Laboratory. She is working in the field of semiconductor device fabrication for the past 30 years. She has worked towards development of GaAs based MMICs and GaN based high power devices. H Her expertise lies in development of etching processes for various applications. She is receipient of DRDO teamwork award for development of MMICs and also Pathbreaking award for development of GaN based device technology as team member. She has published more than thirty papers in peer reviewed journals. She completed her studies from IIT Delhi and joined SSPL Delhi DRDO in 1988.

  • Prof. C. Raman Suri, IIT Ropar
  • Dr. Chandra Shekhar Sharma, IIT Hyderabad
  • Dr. Chandra Shekhar Sharma is an Associate professor in the Department of Chemical Engineering at the Indian Institute of Technology, Hyderabad. Dr. Sharma has obtained his PhD in 2010 from IIT Kanpur under the supervision of Prof. Ashutosh Sharma, in the area of carbon based multiscale micro- and nano-structures and subsequently joined IIT Hyderabad. His research interests are Carbon based hierarchical materials, Nature inspired polymer functional surfaces, Electrospun polymer and carbon nanofibers and Carbon-MEMS. He has received several awards, including the NASI Young Scientist Platinum Jubilee Award (2017), SERB Indo-Us Fellowship (2016), IEI Young Engineer Award (2016), DST Inspire Faculty Award (2015), DST Young Scientist Award (2015), INAE Innovative Project Award (2011), Gandhian Young Technological Innovation Award (2014 & 2015) and IITK Excellence Award for Social Service. Dr. Sharma has been nominated recently as a member for the newly launched Indian National Young Academy of Sciences (INYAS) for five years. This year, Dr. Sharma has also been nominated as a member for National Academy of Sciences, India.  Dr. Sharma has 72 peer-reviewed publications with more than 900 citations in reputed internationaljournals,including Carbon, Langmuir, ACSAppliedMaterialsandInterfaces, Small  and Electrochimica Acta. He has filed 11 national and international patent applications and four book chapters to his credit. Recently, he has been granted a Chinese patent. Dr. Sharma has guided 4 Ph.D. and 8 M.Tech. students as of now and presently supervising 12 Ph.D. students. Some of his research works including (i) electrospun nanofibers based sanitary napkins for feminine hygiene and (ii) candle soot derived carbon as anode material for powering electric vehicles lithium ion battery, (iii) Jamun seed derived activated carbon for fluoride removal from drinking water were recognized as important by Elsevier and received worldwide media attention. Dr. Sharma has also incubated a start-up company, M/s Restyro Technologies Pvt. Ltd. to commercialize some of the technologies developed in his lab including recycling of polystyrene waste using orange peel and nanofibers based feminine sanitary napkins. Both of these innovations has won several Gold Medals at International level in last two years.

  • Er. Chiranjeevi Lakavath, STAR-C, Bangalore
  • Chiranjeevi has done M.Sc. in Organic Chemistry (2010), Kakatiya University, Warangal. After Masters, he has joined as a JRF in Indian Institute of Toxicology Research (2010-2011). He was associated as an Intern with Indian Journal of Chemical Technology (IJCT), at National Institute of Communication and Information Resources, New Delhi (2010-2012). In2012 he joined as a Chemist in Central Ground Water Board, Ministry of Water Resources, Nagpur and worked for two years. He has worked on persistent organic pollutants which causes toxicity and their impact in Maharashtra state. He has published few papers in International Journal and wrote technical reports on ground water quality. Currently (2014 to till date) he is working as Senior Executive Engineer in Etch department at Semiconductor Technology and Applied Research Centre (STAR-C), Ministry of Defence, Bangalore. His area of expertise includes development etching processes and realization MEMS devices such as Pressure sensor, Accelerometer, RF MEMS and other devices. His area of research interests are MEMS, Bio-MEMS, Paper-based microfluidic devices and their applications. Chiranjeevi is the recipient of Best Annotator award for his contribution to Open Source Drug Discovery project by Council of Industrial Research (CSIR), India.

  • Er. Siva Penmetsa, Technology Manager, CeNSE, IISC Bangalore
  • Siva is currently working as Technology Manager for Lithography and Dry Etch at National Nano Fabrication Centre(NNFC), Centre for Nano Science and Engineering(CeNSE), Indian Institute of Science(IISc), Bangalore, India. Earlier to this, Siva was a Technology Manager for Process Integration handling and executing projects from academic, industrial and government organizations and inhouse technology and product development. He has been associated with CeNSE, IISc since 2011 as Senior Facility Technologist with hands on experience on fabrication and characterization of micro and nano devices, and processing and maintaining different lithography, deposition and etch tools. He did his Bachelor of Engineering (B.E) in Electronics and Communication, University of Madras, Chennai and Master of Science in Nanotechnology at Louisiana Tech University, Ruston, USA, He worked as a Research Assistant at Institute for Micromanufacturing (IfM), Louisiana Tech University for 2 years in soft lithography. He has more than 15 publications in international conferences and journal.

  • Er. Yatish Prasad, STAR-C, Bangalore
  • Yatish Prasad is currently working as a Senior Executive Engineer in Photolithography and System Level Testing Department in Semiconductor Technology and Applied Research Centre, Bangalore since 2014. He has completed his M.Tech in VLSI System Design from NIT Warangal and B.Tech in Electronics and Telecommunication from Government   Engineering College, Jagdalpur. Currently, His area of expertise includes development and optimization of complete Photolithography process for MEMS device fabrication. Some of his achievements include the successful fabrication of capacitive accelerometer, silicon tips, MEMS temperature sensor, MEMS-based uncooled bolometer, and pressure sensors. He is also involved in integration, assembly, calibration and testing of MEMS- based pressure transducer.